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  • 1.
    Ekström, Mikael
    et al.
    Mälardalen University, School of Innovation, Design and Engineering. Uppsala University, Sweden.
    Hartmann, Ola
    Uppsala University, Sweden.
    Karlsson, Erik
    Uppsala University, Sweden.
    Lidström, Erik
    Uppsala University, Sweden.
    Granberg, Per
    Uppsala University, Sweden.
    Nygren, M
    Mälardalen University, School of Innovation, Design and Engineering. Stockholm University, Sweden.
    Antiferromagnetism in Zn-doped La2CuO4 as observed by muon spin resonance spectroscopy2001In: Physical Review B - Condensed Matter and Materials Physics, ISSN 0163-1829, Vol. 64, no 18, p. 1845221-1845226, article id 184522Article in journal (Refereed)
    Abstract [en]

    The local fields seen by positive muons implanted in Zn-doped La2CuO4 show a distribution with a main peak attributed to muon sites far from the Zn ions and a satellite structure corresponding to muons residing closer to the Zn. The temperature dependence indicates a strong loss of magnetic order for Cu moments near the Zn atoms. The data can be understood in terms of a model where a Zn ion not only introduces a vacancy in the magnetic Cu lattice but also creates a RKKY-type disturbance. The electron spin polarization around the Zn ions induces a change of the magnetic moments on surrounding Cu ions. The AF lattice is found to be strongly perturbed within a radius of 10 Angstrom around each Zn ion. Possible consequences for the superconductivity of the corresponding Sr-doped materials are discussed.

  • 2.
    Hansson, Björn A. M.
    et al.
    Roy. Inst. of Technology/Albanova, Sweden.
    Hemberg, Oskar
    Roy. Inst. of Technology/Albanova, Sweden.
    Hertz, Hans M.
    Roy. Inst. of Technology/Albanova, Sweden.
    Berglund, Magnus
    Roy. Inst. of Technology/Albanova, Sweden.
    Choi, Hee-June
    Roy. Inst. of Technology/Albanova, Sweden.
    Jacobsson, Björn
    Roy. Inst. of Technology/Albanova, Sweden.
    Janin, Emmanuelle
    Roy. Inst. of Technology/Albanova, Sweden.
    Mosesson, Sofia
    Roy. Inst. of Technology/Albanova, Sweden.
    Rymell, Lars
    Roy. Inst. of Technology/Albanova, Sweden.
    Thoresen, Jalmar
    Roy. Inst. of Technology/Albanova, Sweden.
    Wilner, Martin
    Roy. Inst. of Technology/Albanova, Sweden.
    Characterisation of a liquid-xenon jet laser-plasma extreme-ultraviolet source2004In: Review of Scientific Instruments, ISSN 0034-6748, Vol. 75, no 6, p. 2122-2129Article in journal (Refereed)
    Abstract [en]

    A liquid-xenon-jet laser-plasma source for extreme-ultraviolet (EUV) and soft-x-ray generation has been characterized. Being a source candidate for EUV lithography (EUVL), we especially focus on parameters important for the integration of the source in EUVL systems. The deep-ultraviolet (DUV) out-of-band radiation (=120–400 nm) was quantified, to within a factor of two, using a flying-circus tool together with a transmission-grating spectrograph resulting in a total DUV conversion efficiency (CE) of ~0.33%/2sr. The size and the shape of the xenon plasma was investigated using an in-band-only EUV microscope, based on a spherical Mo/Si multilayer mirror and a charge-coupled device detector. Scalability of the source size from 20–270 µm full width at half maximum was shown. The maximum repetition-rate sustainable by the liquid-xenon-jet target was simulated by a double-pulse experiment indicating feasibility of >17 kHz operation. The xenon-ion energy distribution from the plasma was determined in a time-of-flight experiment with a Faraday-cup detector showing the presence of multi-kilo-electron-volt ions. Sputtering of silicon witness plates exposed to the plasma was observed, while a xenon background of >1 mbar was shown to eliminate the sputtering. It is concluded that the source has potential to meet the requirements of future EUVL systems.

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