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Fluid flow and heat transfer simulation in a barrel type CVD reactor
Mälardalen University, School of Sustainable Development of Society and Technology. (PRO)
(PRO)
2008 (English)Conference paper, Published paper (Refereed)
Abstract [en]

Thin-film coating plays an important role in the manufacturing of many cutting and drilling tools. One of the most common types of thin-film coating methods is chemical vapor deposition that is known as CVD in industry. The CVD involves deposition of a thin film from gas phase precursors onto a solid substrate. The uniformity of film thickness is a critical in tools production. To achieve this uniformity, it is necessary to understand the governing transport processes, flow behavior and heat transfer inside the CVD reactor. In the coming paper the aim is numerical modeling of CVD processes using an existing simulation software, Fluent©. The objective of the work focuses on understanding and predicting the flow regime and heat transfer characteristics in a CVD reactor. At the current stage the work involves studying a single-species flow and heat transfer without chemical reaction. The simulation results will be verified using the real data collected from manufacturing company. These results will show the possibilities in improving the coating efficiency and uniformity in an effective way.

Place, publisher, year, edition, pages
2008.
National Category
Other Engineering and Technologies
Identifiers
URN: urn:nbn:se:mdh:diva-1241ISBN: 978-82-579-4632-6 (print)OAI: oai:DiVA.org:mdh-1241DiVA, id: diva2:37704
Conference
The 49th Scandinavian Conference on Simulation and Modeling (SIMS 2008), Oslo, Norway
Available from: 2008-10-10 Created: 2008-10-10 Last updated: 2017-03-08Bibliographically approved

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Nabati, HamidMahmoudi, Jafar
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CiteExportLink to record
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Citation style
  • apa
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  • vancouver
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  • de-DE
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Output format
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  • asciidoc
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