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Initial stages of ZrO2 chemical vapour deposition on Si(100)-(2x1) from zirconium tetra-tert-butoxide.
Uppsala University.
Mälardalens högskola, Akademin för hållbar samhälls- och teknikutveckling. Mälardalens högskola, Institutionen för biologi och kemiteknik.
Uppsala University.
Uppsala University.
2008 (engelsk)Inngår i: Surface Science, Vol. 602, nr 10, s. 1803-1809Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

The initial stages of chemical vapor deposition of ZrO2 from zirconium tetra-tert-butoxide (ZTB) on Si(100)-(2x1) have been studied by Scanning Tunneling Microscopy (STM) and synchrotron radiation excited Photoelectron Spectroscopy (PES). The STM images and core level (PES) spectra indicate that the predominant surface modifications induced by ZTB are due to silicon carbonization and formation of zirconium dioxide. The carbonization reaction leads to formation of subsurface carbon and two types of reconstructions are discussed: dimer vacancies and dimer vacancies in conjunction with a rotated surface Si-dimer. Indications for the formation of small amounts of zirconium silicide are also found. No evidence for silicon oxidation can be observed with PES, in contrast to the interface properties previously found after larger exposures to ZTB.

sted, utgiver, år, opplag, sider
2008. Vol. 602, nr 10, s. 1803-1809
Emneord [en]
High k dielectrics; Zirconium dioxide; Silicon; Chemical vapor deposition; Semiconductor-insulator interfaces; Synchrotron radiation photoelectron spectroscopy; Scanning tunneling microscopy
HSV kategori
Identifikatorer
URN: urn:nbn:se:mdh:diva-3127DOI: 10.1016/j.susc.2008.03.016ISI: 000256815900013Scopus ID: 2-s2.0-43849086507OAI: oai:DiVA.org:mdh-3127DiVA, id: diva2:115791
Tilgjengelig fra: 2008-03-31 Laget: 2008-03-31 Sist oppdatert: 2013-12-30bibliografisk kontrollert

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